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Tetramethylammonium Hydroxide(TMAH): The Key Choice for Semiconductor Manufacturing

Release time: 2025-03-28

At nowadays, the semiconductor industry has become a crucial driver of the global economy. From smartphones, high-performance computers, and autonomous driving systems to 5G communications and AI chips, semiconductor technology is at the core of modern innovation. In the chip manufacturing process, a key chemical —Tetramethylammonium Hydroxide (TMAH) CAS 75-59-2 supply by BLIT Chemical—plays an indispensable role in photoresist development, silicon wafer etching, and advanced microfabrication.

Tetramethylammonium hydroxide CAS 75-59-2 industrial application

Tetramethylammonium Hydroxide (TMAH) is a highly efficient wet etching chemical widely used in semiconductor wafer processing, integrated circuit (IC) manufacturing, and MEMS production. It provides precise anisotropic etching for silicon substrates, ensuring high accuracy in semiconductor lithography and microelectronic fabrication. Compared to traditional semiconductor etchants, TMAH etching solution supplier by BLIT Chemical offers the following advantages:

● High Selectivity – Precise control of etching rates for advanced nanofabrication
● Low Metal Ion Contamination – Ideal for high-purity semiconductor processing
● Eco-Friendly & Low Toxicity – A safer alternative to hydrofluoric acid (HF) etching
● Optimized for MEMS Production – Essential for microsensor and actuator fabrication

Due to these benefits, TMAH is widely used in semiconductor wafer processing, TFT-LCD panel etching, MEMS device fabrication, and advanced photolithography applications.

In semiconductor production, the slightest contaminants can impact wafer yield and device performance. Thus, electronic-grade TMAH is essential to maintain etching precision and process stability.

The tetramethylammonium hydroxide supplied by our company adopts advanced refining technology and meets the standards of semiconductor-grade chemicals. Significantly reduce metal ion contamination. Our high-purity TMAH solution is optimized for EUV lithography, next-generation chip manufacturing, advanced wafer cleaning and photonic device production.

Semiconductor Fabrication – Used in silicon wafer wet etching, IC patterning, and photoresist stripping
TFT-LCD Manufacturing – Essential for display panel etching and thin-film transistor processing
MEMS & Sensor Production – Key material for silicon micromachining and MEMS device structuring
Printed Circuit Board (PCB) Manufacturing – Applied in copper etching and electronic circuit formation
Optoelectronics & Photonics – Used in laser diode fabrication, fiber optics processing, and photonic crystal etching
Chemical & Pharmaceutical Research – Plays a role in specialty chemical synthesis and high-end lab applications

These applications highlight TMAH’s importance in semiconductor technology, nanotechnology, and microelectronics.

For the product of the TMAH, we ensure that our products comply with strict environmental regulations and international safety standards:

● Eco-Friendly Chemical Processing – Conforms to green manufacturing principles to reduce emissions
● Certified Safe Handling & Storage – Ensures controlled transport and workplace safety

Our products are trusted by semiconductor wafer fabs and high-tech manufacturers

Stable supply chain – ensure continuous supply of large-volume orders

Technical support and process optimization – provide consultation on etching efficiency and chemical compatibility

Competitive pricing and fast delivery – serving the global semiconductor, LCD and MEMS industries

Whether you are a semiconductor wafer manufacturer, MEMS production company, display panel manufacturer or PCB assembly company, we can provide the most reliable BLIT Chemical TMAH solutions to help your high-precision micromachining and next-generation chip production.

Contact BLIT Chemical info@blitchem to get or know more TMAH.

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